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Development of purification engineering technology equipment

Mar 20, 2021
Clean technology, also known as production environment and pollution control technology, is a comprehensive emerging science and technology developed with high technology in recent years. Clean technology usually includes: air purification technology, air conditioning technology, water purification technology, gas purification technology, micro-magazine control technology, clean environment detection technology and related environmental control technology. Purification engineering technology is widely used in high-tech industrial fields such as electronics, nuclear, aerospace, bioengineering, pharmaceuticals, precision machinery, chemicals, food, automobile manufacturing, and modern science.

With the improvement of people’s living standards in our country, people have put forward higher and higher requirements for the living environment and quality of life. High-purity water prepared by water purification equipment has been generally welcomed by people. Purification engineering technology has begun to enter thousands of households and enter people’s modern life. .

Compared with advanced foreign countries, my country's clean technology and equipment are obviously far behind. The HEPA filter that my country only began to produce in 1965 is fifteen years older than foreign countries. The light scattering dust particle counter that started production in 1975 was twenty years later than abroad. 0.1 micron clean technology and equipment have become mature technologies in advanced countries in the world, while my country has just started.




In terms of the scale and technical level of clean room construction, the gap between my country and advanced countries is even greater. Japan’s Shimizu Construction Company. The clean room area under contract from 1982 to 1987 reached 718 thousand square meters, while the total area of clean room under contract in my country is less than 100,000 square meters. Great development. The total area of clean rooms under contract in 1993 was close to 150,000 square meters. The scale of clean room construction in the United States is even larger. In 1998, statistics reached 1.885 million square meters. In terms of the level of clean engineering technology, in the late 1980s, a large number of ultra-clean rooms of 0.1 micron level had been built abroad. In 1987, Sanyo Niigata Factory in Japan built a tenth level clean workshop of 3000 square meters, and NIT logs built four 1000 square meters. Meters control 0.1 micron dust in a thousand-level workshop, and the number of air changes is as high as 300 times per minute. The new US TSMCS plant in Taiwan has built a fourth-generation ducted clean room with a total area of 10,000 square meters. The 0, 1 micron grade 10 clean room used in my country mainly depends on imports from abroad. Because the cost of a clean room with a high level of cleanliness is very expensive, the cost per square meter of a 0.1 micron class 10 clean room is as high as 10,000 US dollars. Clean workshops occupies a very high proportion of investment in large-scale integrated circuit manufacturing equipment, which is incompatible with the development trend of continuous update of integrated circuit technology and faster and faster product replacement cycles, which seriously restricts the development of large-scale integrated circuit technology. development of. The equipment and technology of submicron production microenvironment system using isolation technology developed by American ASYST Company and German MW Company have been widely adopted in recent years. This latest clean technology adopts a micro-environment in which the process equipment partially uses isolation technology in a clean workshop with a level of 100 cleanliness, which reduces the investment ratio to a high-level micro-environment and eliminates the source of secondary pollution caused by the operation of the operator and the process equipment It has an effect on the yield and reliability of integrated circuits.

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